Difference between revisions of "Photoresist"
From Applied Optics Wiki
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| + | Photoresists are used to coated and pattern substrates. They are normally | ||
| + | spincoated and patterned by exposing to UV light in the [[mask aligner]] (through a [[mask]]). | ||
| + | |||
| + | They come in postive and negative varieties. In a positive resist holes are made in the film where it has been exposed to UV light, in a negative resist holes are made where it hasn't been exposed to UV light. | ||
| + | |||
The following resists are used in the Fab Lab: | The following resists are used in the Fab Lab: | ||
| − | [[PMMA]] | + | [[PMMA]] negative |
| − | [[BPO]] | + | |
| + | [[BPO]] positive | ||
Latest revision as of 11:32, 5 May 2010
Photoresists are used to coated and pattern substrates. They are normally spincoated and patterned by exposing to UV light in the mask aligner (through a mask).
They come in postive and negative varieties. In a positive resist holes are made in the film where it has been exposed to UV light, in a negative resist holes are made where it hasn't been exposed to UV light.
The following resists are used in the Fab Lab:
PMMA negative
BPO positive
