Difference between revisions of "How to SU8"

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(Created page with "!!!ALWAYS WORK UNDER THE FUME CUPBOARD WHEN HANDLING SU8 AND ITS ASSORTED CHEMICALS!!! (The following instructions are for SU8-100 and can also be applied to SU8-50. Check with m...")
 
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(8) Use a glass syringe to spread (2ml volume would be OK). Keep it in [[aceton]] until needed.
 
(8) Use a glass syringe to spread (2ml volume would be OK). Keep it in [[aceton]] until needed.
  
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Cleaning of substrates / samples should always be done in the fumecupboard. Lab coat, goggles and gloves should be worn at all times.
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(9) Measure 1ml of SU8 (slowly because the barrel might run out of travel) and spread it in a spiral motion, so that it covers all the surface of the sample.
  
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Useclean glassware, the ultrasonic bath should be ~half full of water, topup with [[ultrapure water]] or [[distilled]] if required and samples
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(10) Clean the syringe immediately.
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should be placed in clean glassware, just covered in solvent in the bath.  
 
  
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The [[nitrogen]] should be on at the bottle and the N2 gun line should be set to 1 bar.
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(11) Spin coat.
  
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(1) 8 minutes in [[ethyl lactate]] (yellow bottle) in the ultrasonic bath.
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(12) Bake on a hot plate @66°C for 20' and then @95°C  for 50'. Make sure hot plate is flat to avoid thickness fluctuations. Let sample cool down to room temperature on hot plate.
  
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Dry with the [[nitrogen]] gun.
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(13) Turn on mask aligner.
  
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(2) 8 minutes in [[acetone]] in the ultrasonic bath.
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(14) Develop pattern. Exposure time depends on how old the UV lamp is, so adjust accordingly.
  
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Do not dry with the [[nitrogen]] gun as actetone fumes are to be avoided.
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(15) Post exposure bake: 1' @65°C then 12'@95°C. The pattern will start developing by now.
  
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(3) Rinse with [[methanol]] then 8 minutes in the ultrasonic bath.
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(16) The developer for SU8 is the EC solvent (smells really bad, so keep the sash of the hood as low as possible!)
  
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Dry with the [[nitrogen]] gun.
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(17) Wash your photolith mask with [[aceton]].
  
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(4) 8 minutes in [[isopropanol]] (blue bottle) in the ultrasonic bath.
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(18) After the sample has been heated, switch off the hot plate and let the sample cool down SLOWLY on the hot plate.
  
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Finally dry the samples and put into a clean beaker. The samples are now clean and ready to use.
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(19) When cooled at room temperature, it needs to be developed.
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:put some developer in a beaker and let the sample in for ~5' while it's agitated.
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:stop the procedure with IPA.
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:If it's "milky" it means it's underdeveloped and needs to go back in to the developer.
  
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Betweenthe stages the beakers should be cleaned. to do this, wash out thebeaker with the same chemicals in order as above and place upside downat the back of the fume cupboard on a tissue to dry. Once dry they canbe used again or put into the glassware cupboard.
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Good Luck!
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Ifthe wash bottles get low/empty, they can be refilled by topping up fromthe main store bottles in the chemical cupboard. bottles should betopped up in the fume cupboard and any spillage wiped off the mainbottle before being put back into the cupboard.
 
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When finished turn off the nitrogen both at the main bottle and at the fume cupboard.
 

Revision as of 12:01, 19 August 2011

!!!ALWAYS WORK UNDER THE FUME CUPBOARD WHEN HANDLING SU8 AND ITS ASSORTED CHEMICALS!!! (The following instructions are for SU8-100 and can also be applied to SU8-50. Check with microchem for guidelines for other version of SU8)

(1) Put SU8 in a small beaker (~10ml in total)

(2) Heat ~7ml of SU8


(3) Heat up a hot plate @66°C for 10'(until it's runny).

(4) Calculate 1ml/inch (or 1ml/2cm).

(5) Set the spinner.

(6) Do a manual spread: You have 10 to set the spread from 0 to 500rpm.

(7) Set the spin spread @2500rpm for 30 (or adjust spread as required)

(8) Use a glass syringe to spread (2ml volume would be OK). Keep it in aceton until needed.

(9) Measure 1ml of SU8 (slowly because the barrel might run out of travel) and spread it in a spiral motion, so that it covers all the surface of the sample.

(10) Clean the syringe immediately.

(11) Spin coat.

(12) Bake on a hot plate @66°C for 20' and then @95°C for 50'. Make sure hot plate is flat to avoid thickness fluctuations. Let sample cool down to room temperature on hot plate.

(13) Turn on mask aligner.

(14) Develop pattern. Exposure time depends on how old the UV lamp is, so adjust accordingly.

(15) Post exposure bake: 1' @65°C then 12'@95°C. The pattern will start developing by now.

(16) The developer for SU8 is the EC solvent (smells really bad, so keep the sash of the hood as low as possible!)

(17) Wash your photolith mask with aceton.

(18) After the sample has been heated, switch off the hot plate and let the sample cool down SLOWLY on the hot plate.

(19) When cooled at room temperature, it needs to be developed.

put some developer in a beaker and let the sample in for ~5' while it's agitated.
stop the procedure with IPA.
If it's "milky" it means it's underdeveloped and needs to go back in to the developer.

Good Luck!

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