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Photoresists are used to coated and pattern substrates. They are normally spincoated and patterned by exposing to UV light in the mask aligner (through a mask).

They come in postive and negative varieties. In a positive resist holes are made in the film where it has been exposed to UV light, in a negative resist holes are made where it hasn't been exposed to UV light.

The following resists are used in the Fab Lab:

PMMA negative

BPO positive